NTEGRA Prima is a multifunctional device for performing the most typical tasks in the field of Scanning Probe Microscopy. The device is capable of performing more than 40 measuring methods, what allows analyzing physical and chemical properties of the surface with high precision and resolution. It is possible to carry out experiments in air, as well as in liquids and in controlled environment.
The new generation electronics provides operations in high-frequency (up to 5MHz) modes. This feature appears to be principal for the work with high-frequency AFM modes and using high-frequency cantilevers.*
There are several scanning types implemented in NTEGRA Prima: scanning by the sample, scanning by the probe and dual-scanning. On account of that, the system is ideal for investigating small samples with ultra-high resolution (atomic-molecular level) as well as for big samples and scanning range up to 100x100x10 µm.
The unique DualScan TM mode allows investigating even bigger fields on the surface (200x200 µm for X, Y and 22 µm for Z) that can be useful, for example, for living cells and MEMS components.
Built-in three axes closed loop control sensors trace the real displacement of the scanner and compensate unavoidable imperfections of piezoceramics as non-linearity, creep and hysteresis. The sensors, which are used by NT-MDT, have the lowest noise level, thus allowing working with closed loop control on the very small fields (down to 10x10 nm). This is especially valuable for carrying out nanomanipulation and lithography modes. NTEGRA Prima has a built-in optical system with 1 µm resolution, which allows imaging the scanning process in real-time.
Due to the open architecture, the functionality of NTEGRA Prima can be extended essentially: specialized magnetic measurements with external magnetic field, high-temperature experiments, Near-field optical microscopy, Raman spectroscopy, etc.
* E.g. the unique method of Atomic-Force Acoustic Microscopy (AFAM) allows investigating soft and hard samples with carrying out quantitative measurements of Young modulus in every scanning point. AFAM allows obtaining much better contrast as compared to Phase Imaging Mode for the soft objects, and makes possible the obtainment of contrast on the hard samples, what is a very hard task when one uses other methods.
AFM (contact + semi-contact + non-contact) / Lateral Force Microscopy / Phase Imaging/ Force Modulation/ Adhesion Force Imaging/ Lithography: AFM (Force)
STM/ Magnetic Force Microscopy/ Electrostatic Force Microscopy/ Scanning Capacitance Microscopy/ Kelvin Probe Microscopy/ Spreading Resistance Imaging/ Lithography: AFM (Current), STM/ AFAM (optional)
|Scan type||Scanning by sample||Scanning by probe*|
|Sample size||Up to 40 mm in diameter,
to 15 mm in height
|Up to 100 mm in diameter,
up to 15 mm in height
|Sample weight||Up to 100 g||Up to 300 g|
|XY sample positiniong||5x5 mm|
|Positioning resolution||readable resolution - 5 um
sensitivity - 2 um
|Scan range||100x100x10 um
Less than 1x1x1 um
|Up to 200x200x20 um**(DualScanTM mode)|
|Non linearity, XY
(with closed loop sensors)
|≤ 0.1%||≤ 0.15%|
|Noise level, Z
(RMS in bandwidth 1000 Hz)
|With sensors||0.04 nm (typically),
≤ 0.06 nm
|0.06 nm (typically),
≤ 0.07 nm
|Without sensors||0.03 nm||0.05 nm|
|Noise level, XY***
(RMS in bandwidth 200 Hz)
|With sensors||0.2 nm (typically),
≤ 0.3 nm (XY 100 um)
|0.1 nm (typically),
≤ 0.2 nm (XY 50 um)
|Without sensors||0.02 nm (XY 100 um),
0.001 nm (XY 3 um)
|0.01 nm (XY 50 um),|
|Linear dimension estimation error
|± 0.5%||± 1.2%|
|Optical viewing system||Optical resolution||1 um
(0.4 um optional, NA 0.7)****
|Field of view||4.5-0.4 mm||2.0-0.4 mm|
|Vibration isolation||Active||0.7-1000 Hz|
|Passive||above 1 kHz|
* Scanning head can be configured to serve as a stand-alone device for specimens of unlimited sizes.
** Optionally can be expanded to 200x200x20 мm.
*** Built-in capacitive sensors have extremely low noise and any area down to 50x50 nm can be scanned with closed-loop control.
**** High Resolution Viewing system (HRV head) is optional and provides additional functionality making it possible to generate and detect tip-localized aperture less near-field effects.